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AuthorYang, Kaichao
AuthorAbu-Reesh, Ibrahim M.
AuthorHe, Zhen
Available date2023-05-16T09:07:32Z
Publication Date2023
Publication NameJournal of Hazardous Materials Letters
ResourceScopus
ISSN26669110
URIhttp://dx.doi.org/10.1016/j.hazl.2023.100075
URIhttp://hdl.handle.net/10576/42783
AbstractMicrobial electrochemical systems (MES) are studied to degrade organic contaminants with a lower energy demand, but degradation of recalcitrant compounds tends to be challenging. To enhance contaminant degradation in MES, advanced oxidation processes (AOPs) are synergistically linked to create cooperative processes such as bio-electro-Fenton (BEF) and enhanced bioanodes. BEF can achieve a high contaminant degradation efficiency with a low energy consumption due to the ability for energy recovery from the anodic organic wastes. Modifying a bioanode with catalytic oxidation materials, e.g., photocatalyst and MnO2, will achieve organic removal via the cooperation of catalysis and biodegradation. This paper has provided a concise review on the integration of AOPs with MES and identified and discussed the challenges such as deeper understanding of the electron transfer mechanisms, development of low-cost membrane, and the synergetic effects between functional materials and bacteria that are important to develop AOP-MES treatment systems. 2023 The Authors
SponsorThis paper was made possible by NPRP grant # [ NPRP13S-0109-200029 ] from the Qatar National Research Fund (a member of Qatar Foundation). K. Y. would like to thank the support from Department of Energy, Environmental and Chemical Engineering, Washington University in St. Louis. The findings achieved herein are solely the responsibility of the authors.
Languageen
PublisherElsevier
SubjectBio-electro-Fenton
Enhanced bioanode with catalysts
Integration process
Removal and mineralization
Toxic and recalcitrant compounds
TitleEnhancing organic contaminant degradation through integrating advanced oxidation processes with microbial electrochemical systems
TypeArticle
Volume Number4


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