Production of metal-oxide nanoclusters using inert-gas condensation technique
Author | Ayesh, Ahmad I. |
Available date | 2020-12-02T07:03:51Z |
Publication Date | 2017 |
Publication Name | Thin Solid Films |
Resource | Scopus |
ISSN | 406090 |
Abstract | Inert-gas condensation is a novel technique that can be used to produce nanoclusters for different applications. In the present work, dc sputtering combined with inert-gas condensation were used to produce copper oxide nanoclusters inside an ultra-high vacuum compatible system. The size and yield of nanoclusters could be controlled by adjusting the inert-gas flow rate, sputtering discharge power, and aggregation length. The results revealed that nanoclusters were formed as a result of either or both mechanisms: three-body and two-body collisions. Herein, the three-body collision mechanism is responsible for nanocluster seed production, while two-body collision mechanism is responsible for nanocluster growth through atomic condensation and coagulation of nanoclusters. The inert-gas flow rate was found to be the main factor to determine the nanocluster size. The results were compared with a discrete coagulation system model and revealed reasonable agreement. Thin film of copper oxide nanoclusters was fabricated and used to produce a device. Electrical and optical measurements of the device revealed its suitability for practical applications such as solar cells. 2017 Elsevier B.V. |
Sponsor | The author would like to acknowledge the financial support of Qatar University - grant number (QUUG-CAS-DMSP-15\16-20), and the use of research facility at the Department of Physics, UAE University. |
Language | en |
Publisher | Elsevier B.V. |
Subject | CuO Inert-gas condensation Nanoclusters Sputtering |
Type | Article |
Pagination | 207-213 |
Volume Number | 636 |
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