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AuthorAyesh A.I.
Available date2019-10-06T09:38:33Z
Publication Date2018
Publication NameJournal of Alloys and Compounds
ResourceScopus
ISSN0925-8388
URIhttp://dx.doi.org/10.1016/j.jallcom.2018.02.219
URIhttp://hdl.handle.net/10576/12067
AbstractThis work reports on the production of alloy Ti-Cu nanoclusters by magnetron sputtering and plasma-gas condensation inside an ultra-high compatible system. Inert-gas was introduced inside a source chamber to generate plasma, sputter material from its target, and establish plasma-gas condensation. The nanocluster size and yield were controlled by adjusting the nanocluster source conditions: inert-gas flow rate fAr, aggregation length L, and sputtering discharge power P. Nanoclusters were produced by three-body collision that created nanocluster embryo, and grew further by two-body collision. The dependence of nanocluster size on nanocluster source conditions was modeled using a homogeneous nucleation model where a nanocluster grows from embryo by nanocluster-nanocluster collision and vapor condensation. Controlled oxidation of ionized nanocluster was conducted in-situ which was found to affect nanocluster charge but retain its size. The nanoclusters were deposited on SiO2/Si substrates with pre-formed metal electrodes to produce percolating nanocluster devices. Those devices have useful applications in many fields such as photoelectrochemical diodes for production of hydrogen fuel. 2018 Elsevier B.V.
SponsorThe author would like to acknowledge the financial support of Qatar University - grant number ( QUUG-CAS-DMSP-15?16-20 ).
Languageen
PublisherElsevier Ltd
SubjectInert-gas condensation
Nanoclusters
Sputtering
Ti-Cu
TitleSize-selected fabrication of alloy nanoclusters by plasma-gas condensation
TypeArticle
Pagination299-305
Volume Number745
dc.accessType Abstract Only


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