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AuthorNam Trung, Tran
AuthorKamand, Fadi Z.
AuthorAl tahtamouni, T. M.
Available date2023-08-27T11:01:15Z
Publication Date2020-03-01
Publication NameApplied Surface Science
Identifierhttp://dx.doi.org/10.1016/j.apsusc.2019.144551
CitationNam Trung, T., & Kamand, F. Z. (2020). Elucidating the mechanism for the chemical vapor deposition growth of vertical MoO 2/MoS 2 flakes toward photoelectrochemical applications. Applied Surface Science, 505, 144551.‏
ISSN01694332
URIhttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85075385466&origin=inward
URIhttp://hdl.handle.net/10576/46821
AbstractTo control the growth of layered two-dimensional transition metal dichalcogenide (TMD) materials or complex structures such as heterostructures, it is important to understand the growth mechanism. In this study, we demonstrated the chemical vapor deposition (CVD) growth of vertically aligned MoO2/MoS2 flakes by using sulfur and molybdenum trioxide (MoO3) powders as precursors. Moreover, based on various experimental measurements, a detailed growth mechanism is proposed for elucidating the conversion of MoO2 to MoS2 in the CVD process to achieve vertically aligned MoO2/MoS2 flakes. Our results reveal that two competing pathways for sulfurization reactions occur during the CVD growth process: the dominance of the reactions in the vapor-phase pathway facilitates the formation of parallel-aligned MoS2 flakes, while the dominance of the reactions in the solid-phase pathway determines the formation of vertically aligned MoO2/MoS2 flakes. In addition, the photoelectrochemical (PEC) activity of the vertically aligned MoO2/MoS2 flakes was evaluated for hydrogen production applications based on PEC water splitting. Our results open the door to promote the process for designing the growth of other TMD materials or complex structures, which can be beneficial for use in various applications.
SponsorThis research is supported by a grant from Qatar University under Grant Number GCC-2017-007 . The authors are thankful to QEERI Core Labs for TEM measurements. Appendix A
Languageen
PublisherElsevier B.V.
SubjectChemical vapor deposition
Growth mechanism
MoO /MoS heterostructure 2 2
Photoelectrochemical water splitting
Vertically aligned flakes
TitleElucidating the mechanism for the chemical vapor deposition growth of vertical MoO2/MoS2 flakes toward photoelectrochemical applications
TypeArticle
Volume Number505
dc.accessType Abstract Only


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